Reduce EoMT instance validation mask memory - #942
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Addressed in c21701f and formatted in 6015441. The chunk budget now uses the larger materialized mask surface by pixel count across Validation:
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/review |
What has changed and why?
Implements Task 1 from #941 for the DINOv2 and DINOv3 EoMT instance-segmentation validation paths.
get_labels_masks_scoresunchanged.The metric semantics and original-image evaluation resolution are unchanged.
Refs #941
How has it been tested?
The focused tests are included at:
They compare all labels, masks, and scores from a forced multi-chunk run against a single-chunk run using deterministic tensors.
A full local test run and GPU peak-memory measurement were not available in this environment. CI is requested for the repository test matrix. The device check remaining for review is validation on the same checkpoint/data before and after the change, including
torch.cuda.max_memory_allocated()on a wide image.Did you update CHANGELOG.md?
Did you update the documentation?